Independent consulting in electron optical architecture for resolution- and stability-critical charged particle instrumentation. Engaged by internal development teams to diagnose and resolve resolution limits, aberration impact, and stability constraints in active high-performance programs.
A short, fixed-scope engagement focused on understanding why a system underperforms, behaves unexpectedly, or fails to reach its intended resolution.
Used when:
Includes:
Delivers:
Typical scope: 4 weeks.
Format: Fixed scope, based on available data, fully confidential.
Evaluation of electron optical systems from individual elements through full column configurations, with focus on resolution limits, aberration budgeting, and sensitivity to realistic engineering tolerances.
Used when:
Delivers:
Independent evaluation of aberration mitigation and correction strategies (e.g. multipole, hybrid, phase-plate, or mirror-based), assessed in terms of manufacturability, integration complexity, robustness, and long-term stability within full-system constraints.
Used when:
Delivers:
Wave-optical modelling applied in regimes where geometric approximations break down, including high-resolution, phase-sensitive, and coherent beam operation.
Used when:
Delivers:
Extension of optical design into stable hardware implementation, addressing voltage stability, noise pathways, mechanical constraints, and practical alignment strategies.
Used when:
Delivers:
Engagements integrate seamlessly with internal development programs, typically including:
All work performed is executed by your principal consultant, M. A. R. Krielaart, and is handled as confidential, NDA bound, and aligned with existing team workflows, often via regularly scheduled advisory and progress meetings.
Designed the beam separator, gated deflector, and mirror system for a quantum electron microscope. Positioned the separator to separate incident and outgoing beam paths while maintaining proper field-ray propagation and minimizing trajectory dispersion. Performance simulations and analysis ensured minimal aberration and preserved flexibility for future multi-reflection operation within the mirror system.
Designed and analysed an aberration corrector for a resolution-critical electron optical system. Conducted tolerance analysis to quantify the impact of machining and assembly deviations on achievable resolution, providing structured trade-offs between fabrication precision and system performance. Solutions were optimized to support both current and potential future iterations of the system while maintaining stability and manufacturability under realistic engineering constraints.
Studied the effect of topologically patterned mirrors on the phase of reflected electron beams. Analytical modelling of the Schrödinger equation was coupled with numerical solution techniques to quantify how pattern parameters influence phase modulation. Results informed design choices for phase-sensitive beam control.
Early design decisions in complex electron optical systems determine ultimate resolution, stability margins, and integration complexity. Independent advisory can:
This ensures engineering decisions are guided by objective and independent domain expertise without committing internal resources prematurely.
I am available for project-based consulting and technical advisory roles in advanced electron beam system development. Engagements are tailored to internal development workflows and focused on performance-critical programs.
Please provide your email address and I will reach out shortly to discuss options. For confidentiality, no project details are requested here. You will also receive an instant email containing my contact information for your reference. Or, connect with me on LinkedIn.
How we treat your data. The information that you provide us by submitting the form will be treated confidentially and is solely used to facilitate our conversation.